3 Rotary Target Plasma Sputtering Coater with Substrate Heater

3 Rotary Target Plasma Sputtering Coater with Substrate Heater

3 rotary target plasma sputtering coater is a compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C

Inquire Now

3 rotary target plasma sputtering coater is a compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1-3 types of metallic materials to sample with the diameter up to 50 mm.Three sputtering targets: gold, silver, copper are included for immediate use.

3 rotary target plasma sputtering coater is a compact plasma thin film sputter (DC common type). The control panel adopts the touch screen mode. The substrate has a limit of 2", the sample is placed with a diameter of Ø50mm and the heating temperature is 500℃.3 rotary target plasma sputtering coater can sputter gold, silver and copper targets, and can not sputter light metals and carbon. This machine uses a rotating sample stage to sequentially coat three layers on the same sample.The film is suitable for the preparation of samples in the laboratory.

3 rotary target plasma sputtering coater specifications:

Input Power

Single phase 220 VAC, 50 / 60Hz

700 W (including vacuum pump)

For using 110 VAC, we will include a transformer for you.

Output Power

1600 VDC,40 mA max

Vacuum Chamber

Vacuum chamber: 150 mm ID×165mm OD×150 mm H, made of high purity quartz

Sealing flange made of stainless steel with flat O-ring