Home > Products > Lab Plasma Cleaner
10L 2.45GHz vacuum microwave plasma cleaner10L 2.45GHz vacuum microwave plasma cleaner

10L 2.45GHz vacuum microwave plasma cleaner

    The 2.45GHz microwave plasma cleaning machine is a device that uses microwave energy to excite process gases and generate plasma for cleaning and surface treatment

The 2.45GHz microwave plasma cleaning machine is a device that uses microwave energy to excite process gases and generate plasma for cleaning and surface treatment. It operates in a vacuum state, ionizing gases into plasma through high-frequency alternating electric fields, which physically bombard or chemically react with micro-particle contaminants or organic contaminants, thereby achieving the purpose of cleaning and activating surfaces.

Product Overview

This equipment mainly consists of an operating control system, vacuum chamber, equipment frame, gas supply system, microwave power supply, and vacuum system. It has both automatic and manual operation modes and can store up to 50 different process recipes, making it convenient for users to select and switch cleaning processes as needed. In addition, the equipment is equipped with various safety features, such as work gas depletion alarm, compressed air pressure below the set value alarm, pump overheating alarm, and reaction chamber leak rate too high alarm.

Product Features

No sputtering, no damage: The microwave plasma is generated by a magnetic field rather than an electric field, with a low self-bias voltage, avoiding charge accumulation, small ion impact, and minimal damage to devices.

No electrode discharge: It avoids contamination caused by sputtering phenomena, which is beneficial for environmental protection and aligns with the concept of green cleaning.

High activity particles and uniform stability: The produced active particles and charged particles are uniformly stable, with high density and low ion kinetic energy, allowing for more uniform and effective cleaning.

Wide application: Suitable for cleaning various materials such as silicon wafers, glass substrates, ceramic substrates, and IC carriers.

High electron density: Compared with plasma generated by low-frequency or radio frequency discharge, the microwave plasma cleaning machine has a higher electron density and lower ion kinetic energy, making it particularly suitable for cleaning sensitive devices.

Green cleaning technology: Microwave plasma cleaning is a green, pollution-free, high-precision dry cleaning method that effectively removes surface contaminants and avoids electrostatic damage.

These features make the 2.45GHz microwave plasma cleaning machine widely used in various fields such as semiconductor packaging, optical components, and electronic devices.

 Purchase Information

If you are interested in our 2.45GHz Microwave Vacuum plasma cleaner, please feel free to contact us for more information and price.

Contact phone number: 183-3926-3857

Email: jack@cysitech.com

Contact person: Jack Yang

WeChat: 183 3926 3857

Detailed Parameter

Product name

2.45GHz Vacuum microwave plasma cleaner

Model number

CY-PC-2.45G-10L-A

Process chamber

Alumina

Chamber capacity

10L

Chamber size

250W× 250D× 170Hmm  option 30/50/100/200/300L

Sample size

6 ", backward compatible, can handle   up to 8 "samples

portal

Front door with heating table 60-200, with observation window

Microwave source

2.45GHzMax1200W   (500/2000/3000W optional)

Gas path

Standard two-channel process gas with   mass flowmeter (optional additional flowmeter, CF4,SF6,O2,Cl2,BCI2)

True space gauge

Pirani

Empty pump

Standard or oil pump Dry pump optional

True empty valve

Electronic pneumatic valve

Control system

10.4 inch touch screen, Windows system,   graphical operation interface

Optional parts

Gas flowmeter (can be upgraded to 4),   optional 250 heating table

Electricity demand

3/N/PE AC 50Hz 400/240V 16A

Overall size

450W× 640D× 725Hmm

Major parts

Component Name

2.45GHz Microwave Vacuun plasma cleaner

Major Host

Microwave Plasma cleaner

Controller

Touch screen control

Major parts

Vacuum pump, Power generator, flowmeter   etc

Random accessories

(vacuum pump ,pipe, wire etc.)

User Manual

Standard

 

Application Fields of 2.45GHz Microwave plasma cleaning machine

 

Here are the translations of the main application areas for Microwave plasma cleaning machine:

Semiconductor Manufacturing: In the semiconductor industry, 40KHz plasma cleaning machines are used to clean delicate substrates, remove particles and films, ensuring a contamination-free surface that is crucial for device performance. 

Biomedical Device Fabrication: In the biomedical field, plasma cleaning technology is used for surface treatment of medical devices to enhance surface energy and improve adhesion across multiple interfaces.

Automotive Manufacturing: In the automotive industry, plasma cleaning machines provide an environmentally sustainable cleaning process, using argon plasma and oxygen plasma to remove organic contaminants and residues, aligning with efforts to reduce hazardous waste and enhance energy efficiency.

Solar Panel Manufacturing: In the manufacturing of solar panels, plasma treatment plays a critical role in preparing metal surfaces and ceramics for the production of photovoltaic cells, ensuring efficiency by removing contaminants like dust or grease.

Medical Device Sterilization: In the healthcare industry, plasma cleaning is proving invaluable in the sterilization of medical devices, working at lower temperatures that reduce the risk of damaging sensitive instruments.

Printing Industry: Plasma cleaning machines are used to improve print quality on plastic, metal, and glass surfaces by altering the surface characteristics of the material to ensure effective printing applications.

Surface Treatment: Plasma cleaning machines are used to modify surface properties such as surface energy, wettability, and contact angle, which is critical for the specific adhesion required in processes like metal soldering or coating.

Application Case: " Cleaning solar panels with a 2.45GHz Microwave plasma cleaning machine "

Here are the steps and processes for cleaning solar panels with a Microwave plasma cleaning machine:

Observation and Analysis: Before cleaning, observe and analyze the degree of contamination on the solar panel surface to determine if there are only dust or other contaminants such as particulates.

Pre-Rinsing: If the solar panel surface has particulates or if it is uncertain whether there are particulates, perform a pre-rinse to remove loose dust and particulates.

Plasma Cleaning: Place the solar panels in the cleaning chamber of the plasma cleaning machine. Start the plasma cleaning machine, which ionizes the cleaning medium's gas molecules into plasma through high-frequency or radio frequency electric fields. Active species in the plasma react with contaminants on the solar panel surface through oxidation, reduction, decomposition, etc., to remove them.

Surface Treatment: Plasma treatment can not only clean the solar panel surface but also alter its surface properties, such as improving surface reflectivity and anti-contamination ability, as well as enhancing light absorption and photovoltaic conversion efficiency.

Enhancing Encapsulation Reliability: During the solar panel encapsulation process, use the plasma cleaning machine to treat the backsheet, lamination components, and module frame surfaces to improve the surface wettability, enhance the bonding strength between the adhesive and materials, and thus improve the reliability and durability of the encapsulated components.

Environmental Protection and Energy Saving: The plasma cleaning machine does not require any harmful chemical solvents during the cleaning process, reducing environmental pollution. At the same time, the cleaning is fast, efficient, and energy-consuming, meeting the requirements for environmental protection and energy saving.

Post-Treatment: After cleaning is complete, inspect the solar panel surface to ensure it is free of residues, and then proceed with subsequent drying and encapsulation work.

Through these steps, the 2.45GHz plasma cleaning machine can effectively clean solar panels and improve their performance and reliability.


Contact Us
  • E-mail: cysi@cysi.wang
  • Tel: +86 371 5519 9322
  • Fax: +86 371 8603 6875
  • Add: No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, Zhengzhou, Henan, China




Follow Us

Copyright © Zhengzhou CY Scientific Instrument Co., Ltd. All Rights Reserved    Update cookies preferences

| Sitemap |       Technical Support: